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Derniers dépôts
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Stéphane Calvez, David Bourrier, Justine Bonneau, Ludovic Salvagnac, Pascal Dubreuil, et al.. Shadow-mask evaporation for the fabrication of optical filters with spatially tailored thickness. Photonics West 2024 -- Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVII, Jan 2024, San Francisco (CA, USA), United States. pp.128980J-3, ⟨10.1117/12.3000178⟩. ⟨hal-04515494⟩
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Jean Baptiste Doucet, S. Pelloquin, Alexandre Lauvergne, E Daran, Sylvain Auge. A UV-NIL resist developed for a transitional soft mold process and the subsequent dry etch transfer into hard materials. 43rd INTERNATIONAL CONFERENCE ON MICRO AND NANOENGINEERING, Sep 2017, Braga, Portugal. 2017. ⟨hal-04466513⟩